Preparation and Characterization of Magnetron Sputtered CN<sub><i>x</i></sub> Films

Cheng Degang; Lu Fanxiu; Yang Lianyin; Song Bo; Tong Yumei

doi:10.13374/j.issn1001-053x.1997.01.020

Volume 19 Issue 1

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Cheng Degang, Lu Fanxiu, Yang Lianyin, Song Bo, Tong Yumei. Preparation and Characterization of Magnetron Sputtered CNx Films[J]. Chinese Journal of Engineering, 1997, 19(1): 100-104. doi: 10.13374/j.issn1001-053x.1997.01.020

Citation:

Cheng Degang, Lu Fanxiu, Yang Lianyin, Song Bo, Tong Yumei. Preparation and Characterization of Magnetron Sputtered CN_x Films[J]. Chinese Journal of Engineering, 1997, 19(1): 100-104. doi: 10.13374/j.issn1001-053x.1997.01.020

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Preparation and Characterization of Magnetron Sputtered CN_x Films

doi: 10.13374/j.issn1001-053x.1997.01.020

Material Science and Engineering School, UST Beijing, Beijing 100083, China

Received Date: 1996-12-02
Available Online: 2021-08-27

Abstract

Abstract

CN_x films have been prepared by DC magnetron sputtering of graphite in pure nitrogen atmosphere. N/C ratio is between 0.21 and 0.42, strongly correlating with deposition parameters. The hardness and modulus are related not only to the N/C ratio,but also to the formation and the amount of C≡N triple bonds in the CN_x films. High bias voltage and high sputtering power are beneficial to the increase of C≡N bands and so are helpful to increase the hardness and bulk modulus.
- magnetron sputtering,
- carbon nitride film,
- hardness